About the Focused ion beam facility
Our focused ion beam - scanning electron microscope (FIB-SEM) systems offer nanoscale imaging and milling capabilities for a wide range of applications. The facility supports research in nanoelectronics, nanophotonics, silicon photonics and quantum devices research.
We specialise in rapid nanostructuring of metallic, semiconducting, and dielectric materials and devices. This includes free-standing nanomembranes, multilayer structures and optical fibres.
Our FIB-SEM systems provide milling resolution down to 30 nanometres (nm) on metal. Additional capabilities include:
- high-resolution electron microscopy
- electron/ion beam-induced deposition of platinum
- chemically accelerated milling of insulators
- energy-dispersive X-ray spectroscopy (EDS)
For all on substrates up to 100 millimetres (mm) in diameter.
We have two FIB-SEM systems. In a dedicated lab, we have an FEI (Thermo Fisher Scientific) Helios 600 Nanolab Dualbeam™. Inside the nanofabrication cleanrooms characterisation suite, we have a Zeiss NVision40 FIB-SEM.
